Photoresist Molecular Group Structure, Synthesis, and Use Method

ChangeBridge: Patent Apps - Organic Chemistry (C07D)

Published March 26th, 2026

Detected March 26th, 2026

Summary

The USPTO has published a new patent application (US20260086460A1) for a bifunctional molecular group structure for photoresists, including a linker, PAG molecule, and PDQ molecule. The application also details synthesis and use methods for this structure, assigned to Shanghai Huali Integrated Circuit Corporation.

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What changed

This document is a published patent application from the USPTO detailing a novel bifunctional molecular group structure for photoresists. The structure comprises a linker, a Photoacid Generator (PAG) molecule, and a Photo-degradable Quencher (PDQ) molecule, with specific bonding requirements and ratios. The application, filed by Shanghai Huali Integrated Circuit Corporation, also covers the synthesis and utilization methods for this photoresist component.

While this is a patent application and not a regulation imposing direct compliance obligations, it signifies innovation in materials science relevant to the semiconductor industry. Companies involved in photoresist development or semiconductor manufacturing may find this technology of interest for potential licensing or competitive analysis. No immediate compliance actions are required for entities outside of those directly involved in patent prosecution or R&D in this specific chemical space.

Source document (simplified)

← USPTO Patent Applications

BIFUNCTIONAL MOLECULAR GROUP STRUCTURE FOR PHOTORESIST, AND SYNTHESIS METHOD, AND USE METHOD FOR THE SAME

Application US20260086460A1 Kind: A1 Mar 26, 2026

Assignee

Shanghai Huali Integrated Circuit Corporation

Inventors

Lingyan QIN, Rui QIAN

Abstract

The present application discloses a bifunctional molecular group structure for a photoresist, including: a linker, a PAG molecule, and a PDQ molecule. The linker contains a carbon-oxygen chemical bond or a carbon-nitrogen chemical bond. Each linker is bonded to both the PAG molecule and the PDQ molecule in a number ratio, and the total number of the PAG molecule and the PDQ molecule is 3 or more. The PAG molecule is bonded to the linker through the carbon-oxygen chemical bond. The PDQ molecule is bonded to the linker through the carbon-nitrogen chemical bond. The present application also discloses a method for synthesizing the bifunctional molecular group structure for a photoresist. The present application further discloses a method for using a photoresist employing the bifunctional molecular group structure. In the present application, the ratio of the PAG molecule to the PDQ molecules can be set.