← USPTO Patent Applications

BIFUNCTIONAL MOLECULAR GROUP STRUCTURE FOR PHOTORESIST, AND SYNTHESIS METHOD, AND USE METHOD FOR THE SAME

Application US20260086460A1 Kind: A1 Mar 26, 2026

Assignee

Shanghai Huali Integrated Circuit Corporation

Inventors

Lingyan QIN, Rui QIAN

Abstract

The present application discloses a bifunctional molecular group structure for a photoresist, including: a linker, a PAG molecule, and a PDQ molecule. The linker contains a carbon-oxygen chemical bond or a carbon-nitrogen chemical bond. Each linker is bonded to both the PAG molecule and the PDQ molecule in a number ratio, and the total number of the PAG molecule and the PDQ molecule is 3 or more. The PAG molecule is bonded to the linker through the carbon-oxygen chemical bond. The PDQ molecule is bonded to the linker through the carbon-nitrogen chemical bond. The present application also discloses a method for synthesizing the bifunctional molecular group structure for a photoresist. The present application further discloses a method for using a photoresist employing the bifunctional molecular group structure. In the present application, the ratio of the PAG molecule to the PDQ molecules can be set.

CPC Classifications

G03F 7/0045 C07D 487/04 G03F 7/0392 G03F 7/38

Filing Date

2025-08-22

Application No.

19307729