Photoresist Molecular Group Structure, Synthesis, and Use Method
Summary
The USPTO has published a new patent application (US20260086460A1) for a bifunctional molecular group structure for photoresists, including a linker, PAG molecule, and PDQ molecule. The application also details synthesis and use methods for this structure, assigned to Shanghai Huali Integrated Circuit Corporation.
What changed
This document is a published patent application from the USPTO detailing a novel bifunctional molecular group structure for photoresists. The structure comprises a linker, a Photoacid Generator (PAG) molecule, and a Photo-degradable Quencher (PDQ) molecule, with specific bonding requirements and ratios. The application, filed by Shanghai Huali Integrated Circuit Corporation, also covers the synthesis and utilization methods for this photoresist component.
While this is a patent application and not a regulation imposing direct compliance obligations, it signifies innovation in materials science relevant to the semiconductor industry. Companies involved in photoresist development or semiconductor manufacturing may find this technology of interest for potential licensing or competitive analysis. No immediate compliance actions are required for entities outside of those directly involved in patent prosecution or R&D in this specific chemical space.
Archived snapshot
Mar 26, 2026GovPing captured this document from the original source. If the source has since changed or been removed, this is the text as it existed at that time.
BIFUNCTIONAL MOLECULAR GROUP STRUCTURE FOR PHOTORESIST, AND SYNTHESIS METHOD, AND USE METHOD FOR THE SAME
Application US20260086460A1 Kind: A1 Mar 26, 2026
Assignee
Shanghai Huali Integrated Circuit Corporation
Inventors
Lingyan QIN, Rui QIAN
Abstract
The present application discloses a bifunctional molecular group structure for a photoresist, including: a linker, a PAG molecule, and a PDQ molecule. The linker contains a carbon-oxygen chemical bond or a carbon-nitrogen chemical bond. Each linker is bonded to both the PAG molecule and the PDQ molecule in a number ratio, and the total number of the PAG molecule and the PDQ molecule is 3 or more. The PAG molecule is bonded to the linker through the carbon-oxygen chemical bond. The PDQ molecule is bonded to the linker through the carbon-nitrogen chemical bond. The present application also discloses a method for synthesizing the bifunctional molecular group structure for a photoresist. The present application further discloses a method for using a photoresist employing the bifunctional molecular group structure. In the present application, the ratio of the PAG molecule to the PDQ molecules can be set.
CPC Classifications
G03F 7/0045 C07D 487/04 G03F 7/0392 G03F 7/38
Filing Date
2025-08-22
Application No.
19307729
Named provisions
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