Shin-Etsu Chemical Patent for Resist Composition

ChangeBridge: EPO Bulletin - Organic Chemistry (C07D)

Published March 18th, 2026

Detected March 23rd, 2026

Summary

The European Patent Office has published a patent application by Shin-Etsu Chemical Co., Ltd. for a novel onium salt, a chemically amplified positive resist composition, and a resist pattern forming process. The patent aims to improve resolution and reduce line edge roughness in pattern formation.

View original document View source feed page

What changed

This document is a patent bulletin from the European Patent Office (EPO) detailing a new patent application by Shin-Etsu Chemical Co., Ltd. The patent, titled 'ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS', describes an onium salt with specific structural features designed to generate acid with controlled diffusion. This is intended to lead to a resist composition with high resolution and reduced line edge roughness (LER).

While this is a patent filing and not a regulatory rule, it is relevant for companies involved in semiconductor manufacturing and photolithography, particularly those using advanced resist technologies. Compliance officers in the pharmaceutical and chemical sectors should be aware of such intellectual property developments as they may impact the supply chain for critical manufacturing materials. No immediate compliance actions are required, but monitoring patent landscapes can inform strategic decisions.

Source document (simplified)

← EPO Patent Bulletin

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

Search Report EP4703795A3 Kind: A3 Mar 18, 2026

Applicants

Shin-Etsu Chemical Co., Ltd.

Inventors

FUKUSHIMA, Masahiro, WATANABE, Satoshi, KOTAKE, Masaaki, MATSUZAWA, Yuta, MASUNAGA, Keiichi, HIROKAWA, Yoshito

Abstract

An onium salt having a substituent group on the carbon atom adjoining the sulfo group in the anion and containing a triarylbenzene or diarylbenzene structure generates an acid with adequate strength and controlled diffusion. A chemically amplified positive resist composition comprising the onium salt has a high resolution and forms a pattern with reduced LER.

IPC Classifications

G03F 7/004 20060101AFI20260210BHEP G03F 7/039 20060101ALI20260210BHEP C07C 309/42 20060101ALI20260210BHEP C07C 381/12 20060101ALI20260210BHEP C07D 327/08 20060101ALI20260210BHEP

Designated States

AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR

View original document →