ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
Search Report
EP4703795A3
Kind: A3
Mar 18, 2026
Applicants
Shin-Etsu Chemical Co., Ltd.
Inventors
FUKUSHIMA, Masahiro, WATANABE, Satoshi, KOTAKE, Masaaki, MATSUZAWA, Yuta, MASUNAGA, Keiichi, HIROKAWA, Yoshito
Abstract
An onium salt having a substituent group on the carbon atom adjoining the sulfo group in the anion and containing a triarylbenzene or diarylbenzene structure generates an acid with adequate strength and controlled diffusion. A chemically amplified positive resist composition comprising the onium salt has a high resolution and forms a pattern with reduced LER.
IPC Classifications
G03F 7/004 20060101AFI20260210BHEP
G03F 7/039 20060101ALI20260210BHEP
C07C 309/42 20060101ALI20260210BHEP
C07C 381/12 20060101ALI20260210BHEP
C07D 327/08 20060101ALI20260210BHEP
Designated States
AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR