Patent Application for 4-Amino-5-Methyl Pyridin-2-One Production Process
Summary
The USPTO has published a patent application (US20260085044A1) detailing an improved process for producing 4-amino-5-methyl-(1H)-pyridin-2-one and its derivatives. The application, filed by MinAscent Technologies GmbH, describes a method using ammonium salts under pressure without gaseous ammonia, aiming for high yield and purity while reducing container corrosion.
What changed
This document is a published patent application from the USPTO for a new process to produce 4-amino-5-methyl-(1H)-pyridin-2-one and its derivatives. The application, filed by MinAscent Technologies GmbH, claims an improved method involving the reaction of 4-hydroxy-5-methyl-(1H)-pyridin-2-one with an ammonium salt under pressure, specifically avoiding the use of aqueous or gaseous ammonia. This approach is intended to achieve high yields and purity while minimizing corrosion to reaction vessels.
As this is a patent application, it does not impose direct regulatory obligations on companies. However, it signifies potential future intellectual property developments in the chemical and pharmaceutical manufacturing sectors. Companies involved in the synthesis of pyridin-2-one derivatives should monitor this application and related patents for potential licensing opportunities or to understand the evolving landscape of production technologies.
Archived snapshot
Mar 26, 2026GovPing captured this document from the original source. If the source has since changed or been removed, this is the text as it existed at that time.
PROCESS FOR THE PRODUCTION OF 4-AMINO-5-METHYL-(1H)-PYRIDIN-2-ONE AND DERIVATIVES
Application US20260085044A1 Kind: A1 Mar 26, 2026
Assignee
MinAscent Technologies GmbH
Inventors
Martin KÜHNAST, Jean NONNENMACHER, Yvonne RICHTER
Abstract
An improved process for the production of 4-amino-5-methyl-(1H)-pyridin-2-one and derivatives. In the process, 4-hydroxy-5-methyl-(1H)-pyridin-2-one is reacted under pressure with an ammonium salt without adding aqueous ammonia or feeding in gaseous ammonia to provide the target compounds in high yield and high purity. The reaction mixture is not or much less corrosive to enamel coatings of a reaction container surface, since gaseous ammonia as reagent is not used.
CPC Classifications
C07D 213/73
Filing Date
2025-09-22
Application No.
19335373
Named provisions
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