USPTO Patent Application: Stable Liquid Bortezomib Formulations

ChangeBridge: Patent Apps - Pharma (A61K)

Published March 26th, 2026

Detected March 26th, 2026

Summary

The USPTO has published a patent application (US20260083760A1) for stable liquid bortezomib formulations filed by Riconpharma LLC. The application describes liquid compositions with specific impurity limits for intravenous or subcutaneous use.

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What changed

This document is a USPTO patent application (US20260083760A1) for "STABLE LIQUID BORTEZOMIB FORMULATIONS" filed by Riconpharma LLC. The application details liquid compositions containing bortezomib, mannitol, and a pharmaceutically acceptable carrier, intended for intravenous or subcutaneous administration. Key aspects include strict limits on specific impurities (Impurity-E, L, J, F, I, U) not exceeding 1.0% individually, and total impurities not exceeding 3.0%.

As this is a patent application, it does not impose direct compliance obligations on regulated entities. However, it signifies potential future intellectual property and market exclusivity for Riconpharma LLC concerning these specific formulations. Companies involved in bortezomib development or manufacturing should be aware of this patent filing as it may impact their own research, development, and commercialization strategies in this therapeutic area.

Source document (simplified)

← USPTO Patent Applications

STABLE LIQUID BORTEZOMIB FORMULATIONS

Application US20260083760A1 Kind: A1 Mar 26, 2026

Assignee

Riconpharma LLC

Inventors

Mukteeshwar Gande, Praveen Reddy Billa, SVB Janardhan Garikipati, Vinay Sudhindra Raichur, Vijaya Kumar Thota

Abstract

Described herein are liquid compositions comprising: bortezomib; mannitol in an amount up to about 50 mg/mL; and a pharmaceutically acceptable carrier, wherein the liquid composition is for intravenous or subcutaneous use; and wherein the liquid composition comprises not more than (NMT) 1.0% of Impurity-E; Impurity-L; Impurity-J; Impurity-F; Impurity-I; or Impurity-U; and NMT than 3.0% of Total Impurities. Methods of making and using these compositions are also described herein.