RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN AND ONIUM SALT COMPOUND

Abstract

A radiation-sensitive composition includes: an onium salt compound represented by formula (1); a polymer including a structural unit which includes an acid-dissociable group; and a solvent. A is a monovalent organic group having 1 to 40 carbon atoms; R1 and R2 are each independently a hydrogen atom, a monovalent fluorine-free organic group having 1 to 20 carbon atoms, a cyano group, a nitro group, a hydroxy group, or an amino group, when there are a plurality of R1s and R2s, the plurality of R1s and R2s are the same or different from each other; m1 is an integer of 1 to 8; and Z+ is a monovalent radiation-sensitive onium cation.

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