RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND AND ACID DIFFUSION CONTROL AGENT

Abstract

A resist composition including a base material component whose solubility in a developing solution is changed by an action of an acid and a compound represented by General Formula (d0). In Formula (d0), Rf represents a fluorinated hydrocarbon group; V0 represents a hydrocarbon group which may have a substituent or a single bond; Y0 represents a divalent linking group having an oxygen atom; I represents an iodine atom; x represents an integer of 1 to 4, y represents an integer of 1 to 4; 2≤x+y≤5 is satisfied; a total number of fluorine atoms contained in x pieces of Rf's is 5 or more; Mm+ represents a sulfonium cation or an iodonium cation; and m represents an integer of 1 or greater.

CPC Classifications