RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND AND ACID DIFFUSION CONTROL AGENT
Application
US20260079394A1
Kind: A1
Mar 19, 2026
Inventors
Tatsuya FUJII, KhanhTin NGUYEN
Abstract
A resist composition containing a resin component whose solubility in a development solution changes under the action of the acid and a compound represented by General Formula (d0). In the formula, Ar is an aromatic ring; Xd is an iodine atom, a fluorine atom, a bromine atom or a fluorinated alkyl group; Rd is a substituent; nd is an integer of 1 or more as long as the valence allows, and md is an integer of 0 or more as long as the valence allows; Ld is a single bond or a divalent linking group; m is an integer of 1 or more, and Mm+ is an m-valent cation
CPC Classifications
G03F 7/0045
C07C 59/88
C07C 59/90
C07C 381/12
C07D 333/76
G03F 7/0382
G03F 7/0384
G03F 7/0395
G03F 7/70033
Filing Date
2023-09-26
Application No.
19108688