← EPO Patent Bulletin

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS

Publication EP4703795A2 Kind: A2 Mar 18, 2026

Applicants

Shin-Etsu Chemical Co., Ltd.

Inventors

FUKUSHIMA, Masahiro, WATANABE, Satoshi, KOTAKE, Masaaki, MATSUZAWA, Yuta, MASUNAGA, Keiichi, HIROKAWA, Yoshito

IPC Classifications

G03F 7/004 20060101AFI20260210BHEP G03F 7/039 20060101ALI20260210BHEP C07C 309/42 20060101ALI20260210BHEP C07C 381/12 20060101ALI20260210BHEP C07D 327/08 20060101ALI20260210BHEP

Designated States

AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR