RADIATION-SENSITIVE COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND
Publication
EP2026029200A1
Kind: A1
Mar 18, 2026
Inventors
The designation of the inventor has not yet been filed
IPC Classifications
G03F 7/004 20060101AFI20260207BHEP
C07C 25/00 20060101ALI20260207BHEP
C07C 69/14 20060101ALI20260207BHEP
C07C 69/76 20060101ALI20260207BHEP
C07C 69/92 20060101ALI20260207BHEP
C07C 381/12 20060101ALI20260207BHEP
C07D 317/70 20060101ALI20260207BHEP
C07D 321/10 20060101ALI20260207BHEP
G03F 7/20 20060101ALI20260207BHEP
G03F 7/039 20060101ALI20260207BHEP
Designated States
AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LI, LT, LU, LV, MC, ME, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR